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1. Identity statement
Reference TypeJournal Article
Siteplutao.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
IdentifierJ8LNKAN8RW/38JE6T2
Repositorydpi.inpe.br/plutao/2010/11.11.16.12.54   (restricted access)
Last Update2011:02.22.17.43.11 (UTC) marciana
Metadata Repositorydpi.inpe.br/plutao/2010/11.11.16.12.55
Metadata Last Update2024:05.17.11.17.15 (UTC) marciana
Secondary KeyINPE--PRE/
DOI10.1016/j.jcrysgro.2010.06.022
ISSN0022-0248
Labellattes: 3801575713681461 3 DíazMaRaAbChHe:2010:GrEuIs
Citation KeyDíazMaRaAbChHe:2010:GrEuIs
TitleGrowth of EuTe islands on SnTe by molecular beam epitaxy
Year2010
MonthSet.
Access Date2024, May 18
Secondary TypePRE PI
Number of Files1
Size880 KiB
2. Context
Author1 Díaz, Beatriz
2 Malachias, A
3 Rappl, Paulo Henrique de Oliveira
4 Abramof, Eduardo
5 Chitta, V. A.
6 Henriques, A. B.
Resume Identifier1
2
3 8JMKD3MGP5W/3C9JJ37
Group1 LAS-CTE-INPE-MCT-BR
2
3 LAS-CTE-INPE-MCT-BR
4 LAS-CTE-INPE-MCT-BR
Affiliation1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Laboratrio Nacional de Luz Sncrotron, Postal Box 6192, Campinas, 13083-970 SP, Brazil
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto de Fsica, Universidade de so Paulo, Postal Box 66318, So Paulo, 05315-970 SP, Brazil
6 Instituto de Fsica, Universidade de so Paulo, Postal Box 66318, So Paulo, 05315-970 SP, Brazil
Author e-Mail Address1
2
3 rappl@las.inpe.br
e-Mail Addressrappl@las.inpe.br
JournalJournal of Crystal Growth
Volume312
Number19
Pages2828-2833
Secondary MarkB2_ASTRONOMIA_/_FÍSICA B1_ENGENHARIAS_II A2_ENGENHARIAS_III B1_ENGENHARIAS_IV A2_INTERDISCIPLINAR B1_MATERIAIS B1_ODONTOLOGIA B2_QUÍMICA
History (UTC)2010-12-06 14:15:17 :: lattes -> ricardo :: 2010
2010-12-07 11:40:30 :: ricardo -> marciana :: 2010
2011-02-22 17:43:11 :: marciana -> administrator :: 2010
2018-06-05 00:12:17 :: administrator -> marciana :: 2010
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
KeywordsSemiconductor growth - Aspect ratio - Atomic force microscopy - Atoms - Crystal structure - Electron diffraction - Epitaxial growth - High energy physics - Lattice mismatch - Magnetic moments - Molecular beam epitaxy - Molecular beams - Reflection - Reflection high energy electron diffraction - Semiconductor quantum dots - Sodium chloride - X ray diffraction - X rays
AbstractSemiconductor magnetic quantum dots are very promising structures, with novel properties that find multiple applications in spintronic devices. EuTe is a wide gap semiconductor with NaCl structure, and strong magnetic moments S=7/2 at the half filled 4f7 electronic levels. On the other hand, SnTe is a narrow gap semiconductor with the same crystal structure and 4% lattice mismatch with EuTe. In this work, we investigate the molecular beam epitaxial growth of EuTe on SnTe after the critical thickness for island formation is surpassed, as a previous step to the growth of organized magnetic quantum dots. The topology and strain state of EuTe islands were studied as a function of growth temperature and EuTe nominal layer thickness. Reflection high energy electron diffraction (RHEED) was used in-situ to monitor surface morphology and strain state. RHEED results were complemented and enriched with atomic force microscopy and grazing incidence X-ray diffraction measurements made at the XRD2 beamline of the Brazilian Synchrotron. EuTe islands of increasing height and diameter are obtained when the EuTe nominal thickness increases, with higher aspect ratio for the islands grown at lower temperatures. As the islands grow, a relaxation toward the EuTe bulk lattice parameter was observed. The relaxation process was partially reverted by the growth of the SnTe cap layer, vital to protect the EuTe islands from oxidation. A simple model is outlined to describe the distortions caused by the EuTe islands on the SnTe buffer and cap layers. The SnTe cap layers formed interesting plateau structures with easily controlled wall height, that could find applications as a template for future nanostructures growth.
AreaFISMAT
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Growth of EuTe...
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4. Conditions of access and use
Languageen
Target Filedias.pdf
User Groupadministrator
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marciana
Reader Groupadministrator
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Visibilityshown
Archiving Policydenypublisher denyfinaldraft24
Read Permissiondeny from all and allow from 150.163
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5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
DisseminationWEBSCI; PORTALCAPES.
Host Collectiondpi.inpe.br/plutao@80/2008/08.19.15.01
6. Notes
NotesSetores de Atividade: Pesquisa e desenvolvimento científico.
Empty Fieldsalternatejournal archivist callnumber copyholder copyright creatorhistory descriptionlevel format isbn lineage mark mirrorrepository nextedition orcid parameterlist parentrepositories previousedition previouslowerunit progress project rightsholder schedulinginformation secondarydate session shorttitle sponsor subject tertiarymark tertiarytype typeofwork url
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